Lithographic wetbench for coating (SUSS-WETBENCH)

Erik Pálesch

The wetbench is a complete basic setup for substrate coating. It consists of built-in spin-coater LabSpin 6 for manual resist dispense, two hot plate modules HP8, and one vapour primer VP8 for HMDS coating (adhesion promoter). It is possible for all built-in equipment to programm recipes for more customized applications. See specifications for more details.

LabSpin 6

sample size: from 1 × 1 cm to 4"

rotational speed: up to 6000 RPM

compatible chemicals (guaranteed): PGMEA, PGME, cyklopentanone, 4-butyrolaktone, 1-methyl-2-pyrollidone, IPA, acetone

max. amount of recipes: 200

max. number of steps in one recipe: 40

step time: 0–999 s

edge bead removal option

HP8

sample size: up to 6" square substrate or 8" wafer

max. amount of recipes: 200

max. number of steps in one recipe: 40

step time: 0–999 s, with 1 s increase

temperature range: 30–250 °C

temperature increase: programmable from 1 °C/min to 10 °C/min

nitrogen purge option, setting of distance from hot plate (more than 0,1 µm) option

VP8

sample size: up to 8" round wafer or 6" square substrate

temperature range: 60–200 °C

vacuum via Venturi nozzle

gas senzor for HMDS and exhaust monitor