+420 54114 9207 | 
info@czechnanolab.cz
+420 54114 9207 | info@czechnanolab.cz
Spin Coater is a device used to apply a film to a substrate. The system will rotate a substrate at various speeds while coating material is dispensed onto its surface. Rotation is continued while the fluid spins off the edges of the substrate, until the desired thickness of the film is achieved.
Spin coating is a procedure used to deposit uniform thin films to flat substrates. Usually a small amount of coating material is applied on the center of the substrate, which is either spinning at low speed or not spinning at all. The substrate is then rotated at high speed in order to spread the coating material by centrifugal force.
| Sample size: | 5x5 mm^2 to 150 mm / 6 inch (125x125 mm^2) |
| Maximum rotation speed: | 12,000 RPM |
| Acceleration: | from 1 RPM increment |
| Instruments: | Reusable process chamber liner, made from Teflon Wafer Alignment Tool Chucks and Adapters for samples with different size |
