+420 54114 9207 | 
info@czechnanolab.cz
+420 54114 9207 | info@czechnanolab.cz
Rigaku Smartlab 9kW is a novel high-resolution X-ray diffractometer dedicatedto characterization of thin films and nano-structures. Due to its modularity,the instrument allows for large variety of X-ray diffraction and scatteringtechniques. The non-destructive analytical techniques reveal information aboutcrystal structure, chemical composition, and physical properties of materials,thin films, and nano-structures.
Universal x-ray diffractometer with various high resolution, low resolutionand polycapilary optics, equipped with a high temperature chamber for in-situmeasurements.
| Radiation | High intensity Cu rotating anode X-ray tube (8 keV photon energy) toenhance signal from very thin layers; 45kV, 200mA |
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| Goniometer | Vertical θ–θ goniometer with an in-plane detector arm. |
| Horizontal sample position can be used for most of the experimentaltechniques without gluing the sample. | |
| Incident optics | CBO with parabolic Goebel mirror, automatic incidence slit |
| Ge 220 2-bounce and 4-bounce monochromators | |
| polycapillary focusing optics | |
| Sample stages | X-Y mapping stage with range 100mm, tilt stage, capillary holder |
| Sample size | maximum diameter 150 mm, thickness up to 25 mm (absolute maximum cca75 mm) |
| Receiving optics | PSA, Ge 220 2-bounce analyzer |
| Detectors | proportional and linear (D-tex) |
| DHS-1100 chamber | up to 1100°C; vacuum, air, inert gases |
| X-ray reflectivity and coplanar diffuse scattering | Thin films and multi-layers of inorganic or organic materials | Thickness of layers (range 1 to hundreds of nm), surface and interfaceroughness, and roughness lateral correlations |
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| Coplanar X-ray diffraction (available at various resolutions) | Epitaxial hetero-structures and nano-structures | Lattice parameters, lattice strain, chemical composition, inter-layerdiffusion |
| Wide angle diffraction | Polycrystalline thin films | Lattice parameters and strain |
| Pole figures measurements | Polycrystalline samples – both, bulk or thin films | Distribution of preferential crystallographic orientation (texture) |
| Grazing incidence X-ray diffraction (GIXRD) | Thin crystalline films | In-plane lattice parameters and preferential crystallites orientation inthin films. Depth resolved measurements |
| Small angle X-ray scattering and grazing incidence small anglescattering – in 1D mode | Nano-particles (in solution or thin films) and nano-porous thin films | Particles and pores size and size distribution, their mutual distance;feature size up to >≈ 100 nm |
| Scanning micro-diffraction | Laterally inhomogeneous samples | Information as for techniques above with lateral resolution down to0.2 mm |
| X-ray diffraction and scattering during annealing | Samples for which thermally induced processes are relevant | Information as above at elevated temperatures up to 1100 °C; Environment:vacuum or air |
